RoHS (A @ Halogen-Free
2038 eGaNm FETs are supplied onlyi
ivaked die form wikh solder bumps.
eGaN® FET DATASHEET EPC2038
EPC – POWER CONVERSION TECHNOLOGY LEADER | EPC-CO.COM | ©2020 | | 1
EPC2038 – Enhancement Mode Power Transistor
with Integrated Reverse Gate Clamp Diode
VDS , 100 V
RDS(on) , 3300 mΩ
ID , 0.5 A
EPC2038 eGaN® FETs are supplied only in
passivated die form with solder bumps.
Die size: 0.9 mm x 0.9 mm
Applications
Synchronous Bootstrap for:
• High Speed DC-DC Conversion
• Wireless Power Transfer
• High Frequency Hard-Switching and
Soft-Switching Circuits
• Lidar/Pulsed Power Applications
• Class-D Audio
Benefits
• Ultra High Efficiency
• Ultra Low RDS(on)
• Ultra Low QG
• Ultra Small Footprint
EFFICIENT POWER CONVERSION
HAL
D
S
G
Maximum Ratings
PARAMETER VALUE UNIT
VDS
Drain-to-Source Voltage (Continuous) 100 V
Drain-to-Source Voltage (up to 10,000 5 ms pulses at 150°C) 120
ID
Continuous (TA = 25°C, RθJA = 100°C/W) 0.5 A
Pulsed (25°C, TPULSE = 300 µs) 0.5
VGS Gate-to-Source Voltage 6 V
TJOperating Temperature -40 to 150 °C
TSTG Storage Temperature -40 to 150
Thermal Characteristics
PARAMETER TYP UNIT
RθJC Thermal Resistance, Junction-to-Case 27
°C/W RθJB Thermal Resistance, Junction-to-Board 91
RθJA Thermal Resistance, Junction-to-Ambient (Note 1) 100
Static Characteristics (TJ = 25°C unless otherwise stated)
PARAMETER TEST CONDITIONS MIN TYP MAX UNIT
BVDSS Drain-to-Source Voltage VGS = 0 V, ID = 125 μA 100 V
IDSS Drain-Source Leakage VDS = 80 V, VGS = 0 V 20 100 μA
IGSS
Gate-to-Source Forward Leakage VGS = 5 V, TJ = 25˚C 0.0001 0.5 mA
Gate-to-Source Forward Leakage#VGS = 5 V, TJ = 125˚C 0.002 1
VFSource-Gate Forward Voltage IF = 0.2 mA, VDS = 0 V 2.7 V
VGS(TH) Gate Threshold Voltage VDS = VGS, ID = 0.1 mA 0.8 1.7 2.5 V
RDS(on) Drain-Source On Resistance VGS = 5 V, ID = 0.05 A 2100 3300 mΩ
VSD Source-Drain Forward Voltage IS = 0.1 A, VGS = 0 V 2.9 V
Note 1: RθJA is determined with the device mounted on one square inch of copper pad, single layer 2 oz copper on FR4 board.
See https://epc-co.com/epc/documents/product-training/Appnote_Thermal_Performance_of_eGaN_FETs.pdf for details.
All measurements were done with substrate connected to source.
# Defined by design. Not subject to production test.
Gallium Nitride’s exceptionally high electron mobility and low temperature coefficient allows very
low RDS(on), while its lateral device structure and majority carrier diode provide exceptionally low QG
and zero QRR. The end result is a device that can handle tasks where very high switching frequency,
and low on-time are beneficial as well as those where on-state losses dominate.